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1 article(s) from Henkel, Karsten

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films

Jörg Haeberle,
Karsten Henkel,
Hassan Gargouri,
Franziska Naumann,
Bernd Gruska,
Michael Arens,
Massimo Tallarida and
Dieter Schmeißer

Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

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Figure 1: Thickness distributions of T-ALD at 200 °C (a) and PE-ALD films at 200 °C (b), 80 °C (c) and rt (d)...

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Figure 2: Ellipsometry results showing thickness homogeneity (a), growth rate (b) and refractive index at 632...

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Figure 3: XPS survey spectra (Mg Kα) of the PE-ALD layers deposited at 200 °C (red curve), 80 °C (blue) and r...

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Figure 4: O1s (a) and Al2p (b) core level spectra (Mg Kα) of the PE-ALD layers deposited at 200 °C (red curve...

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Figure 5: C1s core level spectra (Mg Kα) of the PE-ALD layers deposited at 200 °C (red curve), 80 °C (blue) a...

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Figure 6: Al2p core level spectra (Mg Kα) of the PE-ALD layers deposited at 200 °C (red curve), 80 °C (blue) ...

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Figure 7: O1s core level spectra (Mg Kα) of the PE-ALD samples prepared at rt (a) and 80 °C (b) substrate tem...

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Figure 8: O1s to Al2p elemental ratio versus substrate temperature of PE-ALD layers (blue squares); the data ...

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Figure 9: O1s (a) and Al2p (b) core level spectra of the PE-ALD (red curves) and T-ALD layers (black) deposit...

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Figure 10: Carbon content within PE-ALD layers (blue squares) versus substrate temperature determined by EDX (...

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Figure 11: Infrared absorption index data for PE-ALD layers deposited at 200 °C (red curve), 80 °C (blue) and ...

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Figure 12: Reactor and CCP source of the SENTECH ALD system: SI ALD LL.

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Published 08 Nov 2013

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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films